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44 MFP unit explanation ENWW
Scanner section
Composition
Mechanisms
Mechanism Method
Light source Xenon lamp
Exposure Light source moving slit exposure, static
exposure
Scanning Platen original scanning: 1st, 2nd, and
3rd mirrors are shifted.
ADF original scanning: Original is moved
with light source held stationary.
Lamp power
supply
Lamp cord
Scanner
cooling
Cooling fan